AuN films - Structure and chemical binding

J. H. Quintero, P. J. Arango, R. Ospina, A. Mello, A. Mariño

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

11 Citas (Scopus)


© 2015 John Wiley & Sons, Ltd. AuN films were produced on 304 stainless steel using an arc-pulsed - assisted plasma physical vapor deposition system. The deposition was performed using an Au target in a nitrogen atmosphere at different pressures. The films were characterized using x-ray photoelectron spectroscopy and x-ray diffraction. A 398.1-eV binding energy was observed and assigned to gold nitride species. The x-ray diffraction patterns displayed a crystallographic structure that corresponded to the Au-fcc phase with broad diffraction lines. The observed widening of the Bragg diffraction lines (rocking curves) can be attributed to the presence of interstitial nitrogen atoms in the Au-fcc structure.
Idioma originalInglés estadounidense
Páginas (desde-hasta)701-705
Número de páginas5
PublicaciónSurface and Interface Analysis
EstadoPublicada - 1 ene. 2015


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