Chemical characterization of DC-sputtered In₂O₃ films with a top SnO₂ layer

Ingeniería y ciencia de los materiales

• Binding energy 61%
• Characterization (materials science) 67%
• Chemical analysis 25%
• Glass 30%
• Indium 100%
• Lattice constants 57%
• Magnetron sputtering 51%
• Oxides 33%
• Oxygen 62%
• Reactive sputtering 60%
• Spectroscopy 42%
• Stoichiometry 51%
• Substrates 27%
• Thin films 36%
• Tin 44%
• Vacuum 33%
• X ray diffraction 37%
• X ray photoelectron spectroscopy 93%
• X rays 34%

Física y astronomía

• binding energy 32%
• characterization 42%
• chemical composition 34%
• diffraction 20%
• direct current 60%
• glass 22%
• indium 36%
• indium oxides 37%
• lattice parameters 33%
• magnetron sputtering 32%
• oxygen 46%
• profiles 20%
• spectroscopy 20%
• stoichiometry 36%
• thin films 19%
• tin 35%
• vacuum 24%
• x rays 34%

Compuestos químicos

• Binding Energy 33%
• Cubic Space Group 31%
• Dioxygen 37%
• Glass Substrate 38%
• Lattice Parameter 37%
• Liquid Film 37%
• Oxide 20%
• Polycrystalline Solid 34%
• Reaction Stoichiometry 31%
• Rhombohedral Space Group 43%
• Spectroscopy 24%
• Sputtering 41%
• UV/VIS Spectroscopy 24%
• Vacuum 30%
• X-Ray 23%
• X-Ray Diffraction 19%